Atomic Layer Deposition of Ruthenium and Ruthenium-oxide ThinFilms by Using a Ru(EtCp)$_{2}$ Precursor and Oxygen Gas

标题
Atomic Layer Deposition of Ruthenium and Ruthenium-oxide ThinFilms by Using a Ru(EtCp)$_{2}$ Precursor and Oxygen Gas
作者
关键词
-
出版物
JOURNAL OF THE KOREAN PHYSICAL SOCIETY
Volume 55, Issue 1, Pages 32-37
出版商
Korean Physical Society
发表日期
2009-07-13
DOI
10.3938/jkps.55.32

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