Article
Materials Science, Coatings & Films
Jimmy Thornberg, Stanislav Mraz, Justinas Palisaitis, Fedor F. Klimashin, Pavel Ondracka, Babak Bakhit, Peter Polcik, Szilard Kolozsvari, Lars Hultman, Ivan Petrov, Per O. a. Persson, Jochen M. Schneider, Johanna Rosen
Summary: Understoichiometric Ti(1-x)Al(x)B(2-y) diboride coatings were successfully deposited using DCMS and HiPIMS. The mechanical properties of the coatings were evaluated, showing a decrease in hardness and elastic modulus with increasing Al concentration. The oxidation behavior of the coatings was also studied, revealing that the films with low B content exhibited better oxidation resistance compared to films with higher B content.
SURFACE & COATINGS TECHNOLOGY
(2022)
Article
Chemistry, Multidisciplinary
Christopher Perez, Aaron J. Mcleod, Michelle E. Chen, Su-In Yi, Sam Vaziri, Ryan Hood, Scott T. Ueda, Xinyu Bao, Mehdi Asheghi, Woosung Park, A. Alec Talin, Suhas Kumar, Eric Pop, Andrew C. Kummel, Kenneth E. Goodson
Summary: Aluminum nitride (AlN) is an electrically insulating material with excellent thermal conductivity. This study demonstrates the deposition of AlN films at low temperatures using sputtering, and analyzes their thermal properties based on grain size and interfacial quality. The results show that varying the partial pressure of reactive N2 can significantly alter the thermal conductivity of the films, and the defect densities can be estimated from the measurements, providing insights for optimizing the thermal engineering of AlN.
Article
Materials Science, Characterization & Testing
Murat Danisman
Summary: In this study, Ni thin films were deposited on a glass substrate using different sputtering powers, and the effect of sputtering power on the structural properties of the films was investigated. X-ray diffraction analysis revealed that the grain size of the films increased linearly with increasing sputtering power. Nanoindentation measurements showed that the samples deposited at 400 W exhibited the highest grain size, elastic modulus, and indentation hardness.
Article
Materials Science, Multidisciplinary
Diederik Depla
Summary: The chemical stability of silver films with a thickness below 50 nanometer deposited on glass using DC magnetron sputtering was investigated. The films were exposed to a droplet of a HCl solution in a humid atmosphere and the affected area was monitored. It was found that the affected area increased linearly with time, indicating a diffusive mechanism. The diffusivity was measured as a function of the acid concentration, the presence of an aluminum seed layer, and film thickness, showing a linear correlation with acid concentration and a more complex behavior with film thickness.
Article
Chemistry, Physical
B. F. Malvasio, L. M. Isola, M. F. Giordana, J. A. Malarria
Summary: In this study, Ti-rich NiTiCo thin films were produced and annealed at different temperatures to investigate their microstructures and shape memory behavior. It was found that the sample annealed at 773 K exhibited Guinier-Preston (GP) zones, while Ti2Ni precipitates were observed in the samples annealed at 873 K and 973 K. A higher recoverable strain and negligible irreversible strain were observed in the 773 K annealed sample compared to the others.
JOURNAL OF ALLOYS AND COMPOUNDS
(2022)
Article
Materials Science, Multidisciplinary
J. S. Jung, S. J. Park, J. H. Ye, J. G. Woo, B. S. Bae, E-J Yun
Summary: This study investigated the effects of deposition parameters on the properties of tin oxide thin films deposited by magnetron sputtering. The results showed that the crystal phase and carrier properties of the films varied significantly under different oxygen partial pressures and annealing conditions. Annealing at 400 degrees C increased the oxidation level, bandgap, carrier concentration, and scattering, leading to a decrease in the mobility of the samples.
Article
Materials Science, Coatings & Films
Thomas R. Koenig, Zhaoxia Rao, Eric Chason, Garritt J. Tucker, Gregory B. Thompson
Summary: The study investigates the stress and microstructural evolution of Ni thin films under various sputtering conditions. A kinetic model is used to understand the factors contributing to the intrinsic stress development and their relationship with microstructure. It was found that bimodal grain size distribution in films deposited at the lowest pressure deviated from the model's predictions, impacting the overall fit of the model to experimental data.
SURFACE & COATINGS TECHNOLOGY
(2021)
Article
Materials Science, Multidisciplinary
K. Naveen Kumar, Habibuddin Shaik, Jyothi Gupta, Sheik Abdul Sattar, R. Imran Jafri, Amulya Pawar, V Madhavi, Ashok G. Reddy, G. Nithya
Summary: Tungsten oxide thin films and nano pillars were grown using DC magnetron sputtering, with oxygen partial pressure and surface to volume ratio having a significant impact on coloration efficiency.
MATERIALS CHEMISTRY AND PHYSICS
(2022)
Article
Materials Science, Multidisciplinary
Seda Aysel Tepe, Murat Danisman, Nurhan Cansever
Summary: Titanium and titanium dioxide are popular and promising materials in today's world. Anodic oxidation of titanium thin films can alter their crystalline structure and electrochemical properties, and induce compressive stress in the oxide films.
MATERIALS CHEMISTRY AND PHYSICS
(2022)
Article
Materials Science, Multidisciplinary
Nicolas Martin, Jean-Marc Cote, Joseph Gavoille, Valerie Potin
Summary: Tantalum oxide thin films were deposited using DC reactive magnetron sputtering from a tantalum metallic target and argon + oxygen. The introduction time of the reactive gas, t(ON), during the deposition was found to be a key parameter in the formation of either homogeneous tantalum oxides or periodic Ta/TaOx multilayers. It was also discovered that the optical transmittance and electrical conductivity of the films exhibited a gradual evolution from metallic to semiconducting and finally to dielectric properties as a function of the oxygen concentration.
Article
Engineering, Electrical & Electronic
I. Guler, M. Isik, N. Gasanly
Summary: Layered semiconductor materials are the focus of recent research due to their effective optical properties. This article examines the structural, morphological, and optical properties of Tl2In2S3Se thin films grown by thermal evaporation. Results from XRD, EDS, and AFM techniques reveal a well-defined monoclinic crystalline structure, atomic compositional ratios consistent with the chemical formula, and vibrational modes of the thin film. Transmission and Raman spectroscopy techniques provide information about the band gap energies and Urbach energy of the thin film.
JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS
(2023)
Article
Chemistry, Physical
Swapan Jana, Anil Krishna Debnath, Veerender Putta, Jitendra Bahadur, Anil Kumar Chauhan, Debarati Bhattacharya
Summary: The study investigated the growth of TiO2-x thin films influenced by sputter power and substrate temperature, revealing significant impacts on the surface structure and composition of the films. Crystallinity of the films was achieved only at elevated substrate temperatures, and surface roughness and mass density increased with higher sputter power for films deposited at elevated temperatures.
SURFACE AND INTERFACE ANALYSIS
(2021)
Article
Chemistry, Multidisciplinary
Jesse Daughtry, Abdulrahman S. Alotabi, Liam Howard-Fabretto, Gunther G. Andersson
Summary: The research aims to examine the properties required for producing thin films of TiO2 using RF plasma, with the ability to modify the films through heating to induce defects and change their characteristics. Different deposition regimes were studied to minimize unwanted contaminants and the resulting TiO2 films showed a lower cost alternative to single-crystal TiO2 with known elemental composition and modifiable properties.
NANOSCALE ADVANCES
(2021)
Article
Materials Science, Coatings & Films
Babak Bakhit, Daniel Primetzhofer, Eduardo Pitthan, Mauricio A. Sortica, Eleni Ntemou, Johanna Rosen, Lars Hultman, Ivan Petrov, Grzegorz Greczynski
Summary: Boron-containing materials exhibit unique properties dependent on their chemical bonding and elemental compositions. Compositional analysis of transition-metal diboride thin films using various techniques reveals discrepancies in measuring boron content, emphasizing the importance of combining methods for accurate composition determination.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
(2021)
Article
Materials Science, Coatings & Films
Lakshman Srinivasan, Cyril Jadaud, Francois Silva, Jean-Charles Vanel, Jean-Luc Maurice, Erik Johnson, Pere Roca i Cabarrocas, Karim Ouaras
Summary: We successfully grew polycrystalline GaN thin films on Si (100) substrates at room temperature using radiofrequency reactive magnetron sputtering, with Ar and N-2 as the main sputtering and N-atom precursor gas sources, respectively. The effect of working pressure on the thin film's crystalline quality was studied, and it was found that pressures below 50 mTorr result in amorphous films, while pressures above 50 mTorr result in polycrystalline films. The films grown at 50 mTorr exhibited the best crystallinity with a dominant wurtzite hexagonal structure, and a uniform elemental distribution of Ga and N throughout the growth profile.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
(2023)
