Selective Etching of Graphene Edges by Hydrogen Plasma

标题
Selective Etching of Graphene Edges by Hydrogen Plasma
作者
关键词
-
出版物
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY
Volume 132, Issue 42, Pages 14751-14753
出版商
American Chemical Society (ACS)
发表日期
2010-10-05
DOI
10.1021/ja107071g

向作者/读者发起求助以获取更多资源

Discover Peeref hubs

Discuss science. Find collaborators. Network.

Join a conversation

Create your own webinar

Interested in hosting your own webinar? Check the schedule and propose your idea to the Peeref Content Team.

Create Now