Growth of Crystalline Gd2O3Thin Films with a High-Quality Interface on Si(100) by Low-Temperature H2O-Assisted Atomic Layer Deposition

标题
Growth of Crystalline Gd2O3Thin Films with a High-Quality Interface on Si(100) by Low-Temperature H2O-Assisted Atomic Layer Deposition
作者
关键词
-
出版物
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY
Volume 132, Issue 1, Pages 36-37
出版商
American Chemical Society (ACS)
发表日期
2009-12-15
DOI
10.1021/ja909102j

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