Direct current superposed dual-frequency capacitively coupled plasmas in selective etching of SiOCH over SiC

标题
Direct current superposed dual-frequency capacitively coupled plasmas in selective etching of SiOCH over SiC
作者
关键词
-
出版物
JOURNAL OF PHYSICS D-APPLIED PHYSICS
Volume 45, Issue 2, Pages 025203
出版商
IOP Publishing
发表日期
2011-12-20
DOI
10.1088/0022-3727/45/2/025203

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