Article
Physics, Applied
Peng-Cheng Du, Fang-Jie Zhou, Kai Zhao, Yong-Xin Liu, Fei Gao, You-Nian Wang
Summary: In this work, an experimental study was conducted to investigate the dependence of the neutral gas temperature T-g on external parameters (rf power, pressure, and gas component) in low-temperature inductively coupled rf plasmas. The results showed that neutral gas heating is sensitive to plasma density in both Ar and Ar/O-2 plasmas. T-g increases with pressure/power and decreases with an increase in O-2 content.
JOURNAL OF APPLIED PHYSICS
(2022)
Article
Physics, Fluids & Plasmas
Lei Tong, Yu-Ru Zhang, Jia-Wei Huang, Ming-Liang Zhao, De-Qi Wen, Yuan-Hong Song, You-Nian Wang
Summary: In this study, a hybrid model is used to investigate the evolution of plasma properties in biased ICPs sustained in Cl-2 gases. The results show that the densities of electrons and Cl+ ions increase with bias voltage and ICP power, becoming the dominant species.
PHYSICS OF PLASMAS
(2021)
Article
Physics, Applied
Tugba Piskin, Yuchen Qian, Patrick Pribyl, Walter Gekelman, Mark J. Kushner
Summary: This paper discusses a computational investigation of E-H transitions in pulsed ICPs sustained in Ar/Cl-2 and Ar/O-2 gas mixtures, and the results show that pulsed ICPs in Ar/Cl-2 mixtures are prone to significant E-H transitions due to thermal dissociative attachment reactions with Cl-2 during the afterglow. Antenna geometry and gas mixture have a significant impact on the severity of the E-H transition and the ion energy and angular distributions (IEADs).
JOURNAL OF APPLIED PHYSICS
(2023)
Article
Physics, Fluids & Plasmas
Mate Vass, Sebastian Wilczek, Aranka Derzsi, Benedek Horvath, Peter Hartmann, Zoltan Donko
Summary: The physical characteristics of an argon discharge excited by a single-frequency harmonic waveform in the low-intermediate pressure regime (5-250 Pa) were investigated using particle-in-cell/Monte Carlo collisions simulations. The study found that an electric field develops in the bulk region due to the presence of a plateau of constant electron density. As the pressure increases, the ionization in the bulk region decreases while the excitation rate increases, leading to a more resistive plasma. The experimental data showed good agreement with the computed characteristics, verifying the simulation model.
PLASMA SOURCES SCIENCE & TECHNOLOGY
(2022)
Article
Nanoscience & Nanotechnology
Guanyu Chen, Eric Jun Hao Cheung, Yu Cao, Jisheng Pan, Aaron J. Danner
Summary: The study analyzed dry etching of perovskite oxides using argon-based ICP for photonics applications, demonstrating the effects of different chamber conditions on etching rates and comparing surface roughness of etched LN and BTO. Surface chemical component comparisons using EDS and XPS methods showed no obvious surface state changes according to the measured results.
NANOSCALE RESEARCH LETTERS
(2021)
Article
Physics, Fluids & Plasmas
Vikram Dharodi, Evdokiya Kostadinova
Summary: This paper presents a numerical study of ring structural transitions in strongly coupled dusty plasma confined in a ring-shaped (quartic) potential well with a central barrier. It is observed that increasing the amplitude of the potential leads to a transition from a ring monolayer structure to a cylindrical shell structure. The ring transition is reversible but exhibits hysteresis in the initial and final particle positions. Critical conditions for the transitions exhibit zigzag instabilities or asymmetries.
Article
Nanoscience & Nanotechnology
Fabian Kaufmann, Giovanni Finco, Andreas Maeder, Rachel Grange
Summary: Lithium niobate on insulator is becoming a versatile platform for new photonic integrated devices. Progress has been made to improve the fabrication of optical circuits on a large scale, and the performance has reached remarkable levels. However, the argon etching process is still challenging to optimize due to micro-masking effects and low etch mask selectivity. A workflow is presented to identify the best etching results, and three methods are proposed to achieve redeposition-free lithium niobate etching with good sidewall quality without the need for wet chemistry.
Article
Physics, Fluids & Plasmas
Mark A. Sobolewski
Summary: Capacitively-coupled plasmas generate strong current or voltage signals at harmonics of their driving frequencies. Inductively coupled plasma systems generally do not, unless they are equipped with capacitively-coupled rf bias, which generates strong signals at harmonics of its driving frequency. However, recently a current component was detected at the second harmonic of the inductive source frequency, not the rf-bias frequency at an asymmetric, rf-biased electrode. This study investigates the origin of this current through measurements and numerical models.
PLASMA SOURCES SCIENCE & TECHNOLOGY
(2023)
Article
Nanoscience & Nanotechnology
Wei Yang, Fei Gao, You-Nian Wang
Summary: The effects of excited states on electron kinetics, plasma power absorption, and dissipation in radio frequency low-pressure inductively coupled Ar plasmas are studied numerically. The presence of excited states caused by electron-impact excitations leads to a decrease in electron temperature and an increase in electron density, resulting in a suppression of power deposition deeper into the plasma.
Article
Engineering, Chemical
Nomin Lim, Alexander Efremov, Kwang-Ho Kwon
Summary: Through a comparative study of different gas mixtures on the kinetics of silicon reactive-ion etching, it was found that substituting Ar for O-2 does not affect the polymerizing ability and F/C ratio of the original fluorocarbon molecule, but reduces the density of polymerizing radicals. The dominant etching mechanism in all three gas systems is chemical etching provided by F atoms.
PLASMA CHEMISTRY AND PLASMA PROCESSING
(2021)
Article
Engineering, Aerospace
F. Nicassio, S. Bonuso, G. Scarselli, M. G. De Giorgi
Summary: In this study, both experimental and numerical methods were used to evaluate the effectiveness of dielectric barrier discharge plasma actuators in reducing plate vibrations. The experiments involved velocity measurements, flow visualization, and proper orthogonal decomposition to characterize the plasma actuator and validate the numerical models. Numerical simulations were performed to analyze the plasma effect on the flow around an oscillating plate. It was demonstrated that the control strategy based on plasma actuation effectively reduced plate vibrations, but further research and a more sophisticated control strategy are needed for real applications.
AEROSPACE SCIENCE AND TECHNOLOGY
(2023)
Review
Physics, Multidisciplinary
Yasunori Tanaka
Summary: This paper discusses recent developments and applications of inductively coupled thermal plasmas (ICTP) in materials processing, including traditional cylindrical ICTPs and newer DC-RF hybrid ICTPs. It also introduces modulated induction thermal plasma (MITP) and new configurations like planar-ICTP and loop-ICTP.
ADVANCES IN PHYSICS-X
(2021)
Article
Materials Science, Coatings & Films
Yeong-Min Lim, Young-Hun Hong, Gil-Ho Kang, Chin-Wook Chung
Summary: A highly efficient plasma source is developed using a parallel capacitor in inductively coupled plasmas (ICPs). The power absorbed by the ICP is proportional to its equivalent resistance, which is improved by the parallel resonance between the parallel capacitor and the equivalent inductance. Experimental results show a significant increase in electron density in both argon and oxygen plasmas near the resonance, indicating the effectiveness of this method. The transformer model of the ICP and the power balance equation of the global model provide a good agreement with the experimental results.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
(2023)
Article
Physics, Applied
Sung-Won Cho, Jun-Hyeon Moon, Aixian Zhang, Chin-Wook Chung
Summary: The study shows that external discharge parameters such as applied RF power, operating pressure, and gas flow rate have a significant impact on the uniformity of ion flux. Adjusting the power to the top and bottom antennas can control the distribution of ion flux in different regions, while high pressure can result in local maximum ionization in the vicinity of the antennas, increasing ion flux near the chamber wall.
JOURNAL OF APPLIED PHYSICS
(2021)
Article
Physics, Fluids & Plasmas
Min Young Yoon, H. J. Yeom, Jung Hyung Kim, Won Chegal, Yong Jai Cho, Deuk-Chul Kwon, Jong-Ryul Jeong, Hyo-Chang Lee
Summary: Atomic layer etching (ALE) is an emerging damage-less etching technology for semiconductor fabrication with a feature size of less than 10 nm. This study comprehensively investigated the discharge physics of ICPs with a radio frequency (RF) bias and Ar/C4F6 mixture for ALE, optimizing the discharge condition and achieving etch thicknesses of 0.5-2.0 nm per cycle on various thin films. Fine etch profiles were obtained on patterned wafers.
PHYSICS OF PLASMAS
(2021)
Article
Physics, Applied
Zhiqiang Chen, Yakov E. Krasik, Samuel Cousens, Arun T. Ambujakshan, Cormac Corr, Xiujuan J. Dai
JOURNAL OF APPLIED PHYSICS
(2017)
Article
Physics, Applied
Arun T. Ambujakshan, Jennifer M. Pringle, Cormac S. Corr, Zhiqiang Chen, Johan du Plessis, Peter D. Hodgson, Xiujuan J. Dai
PLASMA PROCESSES AND POLYMERS
(2017)
Article
Physics, Applied
Arun T. Ambujakshan, Abu Sadek, Kevin Magniez, Srikanth Mateti, Edwin Mayes, Gayathri Devi, Jennifer M. Pringle, Johan du Plessis, Zhiqiang Chen, Cormac S. Corr, Peter D. Hodgson, Xiujuan J. Dai
PLASMA PROCESSES AND POLYMERS
(2017)
Article
Physics, Applied
Arun T. Ambujakshan, Jennifer M. Pringle, Zhiqiang Chen, Cormac S. Corr, Johan du Plessis, Peter D. Hodgson, Xiujuan J. Dai
PLASMA PROCESSES AND POLYMERS
(2018)
Article
Materials Science, Coatings & Films
Vahagn Martirosyan, Emilie Despiau-Pujo, Jerome Dubois, Gilles Cunge, Olivier Joubert
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
(2018)
Article
Physics, Fluids & Plasmas
M. Thompson, D. Drummond, J. Sullivan, R. Elliman, P. Kluth, N. Kirby, D. Riley, C. S. Corr
Article
Physics, Fluids & Plasmas
Thomas Body, Samuel Cousens, Juliet Kirby, Cormac Corr
PLASMA PHYSICS AND CONTROLLED FUSION
(2018)
Article
Physics, Applied
V Martirosyan, O. Joubert, E. Despiau-Pujo
JOURNAL OF PHYSICS D-APPLIED PHYSICS
(2019)
Article
Engineering, Mechanical
M. Thompson, K. Song, P. Kluth, N. Kirby, C. S. Corr
SURFACE TOPOGRAPHY-METROLOGY AND PROPERTIES
(2019)
Review
Physics, Applied
Kenji Ishikawa, Tatsuo Ishijima, Tatsuru Shirafuji, Silvia Armini, Emilie Despiau-Pujo, Richard A. Gottscho, Keren J. Kanarik, Gert J. Leusink, Nathan Marchack, Takahide Murayama, Yasuhiro Morikawa, Gottlieb S. Oehrlein, Sangwuk Park, Hisataka Hayashi, Keizo Kinoshita
JAPANESE JOURNAL OF APPLIED PHYSICS
(2019)
Article
Physics, Fluids & Plasmas
K. Song, M. Thompson, G. De Temmerman, C. S. Corr
Article
Physics, Fluids & Plasmas
Samuel Cousens, Jesse Santoso, Cormac S. Corr
PLASMA SOURCES SCIENCE & TECHNOLOGY
(2020)
Article
Physics, Applied
T. Lafleur, C. S. Corr
Summary: A radio-frequency inductively coupled electrothermal plasma thruster operating with argon was experimentally characterized for different mass flow rates, RF powers, and propellant injection configurations. Results showed that a relatively high stagnation pressure is critical for high performance of the thruster.
JOURNAL OF APPLIED PHYSICS
(2021)
Article
Physics, Applied
A. Pascale, T. Lafleur, C. S. Corr
Summary: In this study, reverse vortex gas injection into a supersonic RF inductively coupled plasma torch was investigated. The results showed that compared to the conventional forward vortex configuration, reverse vortex injection can increase the torch stagnation temperature and thermal efficiency, leading to improved performance.
JOURNAL OF PHYSICS D-APPLIED PHYSICS
(2023)
Article
Physics, Fluids & Plasmas
Jesse Santoso, Hannah Willett, Cormac S. Corr
PLASMA SOURCES SCIENCE & TECHNOLOGY
(2018)