Influence of deposition pressure on structural, optical and electrical properties of nc-Si:H films deposited by HW-CVD

标题
Influence of deposition pressure on structural, optical and electrical properties of nc-Si:H films deposited by HW-CVD
作者
关键词
-
出版物
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS
Volume 72, Issue 6, Pages 685-691
出版商
Elsevier BV
发表日期
2011-03-09
DOI
10.1016/j.jpcs.2011.02.019

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