Influence of the Oxygen Substoichiometry and of the Hydrogen Incorporation on the Electronic Band Structure of Amorphous Tungsten Oxide Films

标题
Influence of the Oxygen Substoichiometry and of the Hydrogen Incorporation on the Electronic Band Structure of Amorphous Tungsten Oxide Films
作者
关键词
-
出版物
Journal of Physical Chemistry C
Volume 118, Issue 24, Pages 12632-12641
出版商
American Chemical Society (ACS)
发表日期
2014-05-23
DOI
10.1021/jp502092h

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