Oxidation Rate Effect on the Direction of Metal-Assisted Chemical and Electrochemical Etching of Silicon

标题
Oxidation Rate Effect on the Direction of Metal-Assisted Chemical and Electrochemical Etching of Silicon
作者
关键词
-
出版物
Journal of Physical Chemistry C
Volume 114, Issue 24, Pages 10683-10690
出版商
American Chemical Society (ACS)
发表日期
2010-05-28
DOI
10.1021/jp911121q

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