Dip-Pen Nanolithography-Generated Patterns Used as Gold Etch Resists: A Comparison Study of 16-Mercaptohexadecanioc Acid and 1-Octadecanethiol

标题
Dip-Pen Nanolithography-Generated Patterns Used as Gold Etch Resists: A Comparison Study of 16-Mercaptohexadecanioc Acid and 1-Octadecanethiol
作者
关键词
-
出版物
Journal of Physical Chemistry C
Volume 113, Issue 10, Pages 4184-4187
出版商
American Chemical Society (ACS)
发表日期
2009-02-18
DOI
10.1021/jp810746j

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