Modelling of the implantation and the annealing stages of 800keV 3He implanted tungsten: Formation of nanovoids in the near surface region

出版年份 2012 全文链接

标题

作者

关键词

出版物

Volume 429, Issue 1-3, Pages 78-91

出版商

Elsevier BV

发表日期

2012-05-31

DOI

10.1016/j.jnucmat.2012.05.024

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