The risk of relapse after a clinically isolated syndrome is related to the pattern of oligoclonal bands

标题
The risk of relapse after a clinically isolated syndrome is related to the pattern of oligoclonal bands
作者
关键词
-
出版物
JOURNAL OF NEUROIMMUNOLOGY
Volume 226, Issue 1-2, Pages 143-146
出版商
Elsevier BV
发表日期
2010-06-11
DOI
10.1016/j.jneuroim.2010.05.032

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