期刊
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY
卷 11, 期 3, 页码 2292-2297出版社
AMER SCIENTIFIC PUBLISHERS
DOI: 10.1166/jnn.2011.3559
关键词
Superhydrophobic; Chemical Etching; Silicon Nanowire Array; Hierarchical Structure
类别
资金
- NNSF of China [60778033]
- Research Grants Council of the Hong Kong SAR [CityU 123607]
- National Basic Research Program of China [2006CB933000, 2009CB623703]
We present a simple approach for preparing hydrophobic silicon surfaces by constructing silicon nanowire arrays using Ag-assisted chemical etching without low-surface-energy material modification. The static and dynamic wetting properties of the nanostructured surfaces and their dependence on etching conditions were studied. It was revealed that the surface topologies of silicon nanowire arrays and their corresponding wetting properties could be tuned by varying the etching time. Under optimized etching conditions, superhydrophobic surfaces with an apparent contact angle larger than 150 degrees and a sliding angle smaller than 10 degrees were achieved due to the formation of a hierarchical structure. The origin of hydrophobic behavior was discussed based on Wenzel and Cassie models. In addition, the effects of surface modification of Si surface nanostructures on their hydrophobic characteristics were also investigated.
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