期刊
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY
卷 8, 期 10, 页码 5566-5570出版社
AMER SCIENTIFIC PUBLISHERS
DOI: 10.1166/jnn.2008.1349
关键词
ZnSiO3 Nanocrystal; ZnO Thin Film; Si Substrate; Focused Electron Beam; Nanocrystal Formation Mechanism
Locally distributed crystalline ZnSiO3 nanoparticles embedded in a SiO2 layer inserted between the ZnO thin film and the Si substrate were formed using transmission electron microscopy (TEM) with a focused electron beam irradiation process. High-resolution TEM (HRTEM) images and energy dispersive X-ray spectroscopy (EDS) profiles showed that ZnSiO3 nanocrystals with a size of approximately 6 nm were formed in the SiO2 layer. The formation mechanisms of the ZnSiO3 nanocrystals in the SiO2 layer are described on the basis of the HRTEM images and the EDS profiles.
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