Mechanistic details of atomic layer deposition (ALD) processes for metal nitride film growth

标题
Mechanistic details of atomic layer deposition (ALD) processes for metal nitride film growth
作者
关键词
-
出版物
JOURNAL OF MOLECULAR CATALYSIS A-CHEMICAL
Volume 281, Issue 1-2, Pages 35-43
出版商
Elsevier BV
发表日期
2007-06-20
DOI
10.1016/j.molcata.2007.06.010

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