4.4 Article

Femtosecond laser machining of multi-depth microchannel networks onto silicon

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IOP PUBLISHING LTD
DOI: 10.1088/0960-1317/21/4/045027

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  1. IMRA America Inc., National Science Foundation (NSF)
  2. Directorate For Engineering [0934342] Funding Source: National Science Foundation
  3. Div Of Industrial Innovation & Partnersh [0934342] Funding Source: National Science Foundation

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Direct writing of multi-depth microchannel branching networks into a silicon wafer with femtosecond pulses at 200 kHz is reported. The silicon wafer with the microchannels is used as the mold for rapid prototyping of microchannels on polydimethylsiloxane. The branching network is designed to serve as a gas exchanger for use in artificial lungs and bifurcates according to Murray's law. In the development of such micro-fluidic structures, processing speed, machining range with quality surface, and precision are significant considerations. The scan speed is found to be a key parameter to reduce the processing time, to expand the machining range, and to improve the surface quality. By fabricating a multi-depth branching network as an example, the utilization of femtosecond pulses in the development of microfluidic devices is demonstrated.

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