Nickel silicide thin films as masking and structural layers for silicon bulk micro-machining by potassium hydroxide wet etching

标题
Nickel silicide thin films as masking and structural layers for silicon bulk micro-machining by potassium hydroxide wet etching
作者
关键词
-
出版物
JOURNAL OF MICROMECHANICS AND MICROENGINEERING
Volume 18, Issue 9, Pages 095002
出版商
IOP Publishing
发表日期
2008-07-25
DOI
10.1088/0960-1317/18/9/095002

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