Source for extreme ultraviolet lithography based on plasma sustained by millimeter-wave gyrotron radiation

出版年份 2012 全文链接

标题

作者

关键词

出版物

Volume 11, Issue 2, Pages 021123-1

出版商

SPIE-Intl Soc Optical Eng

发表日期

2012-05-22

DOI

10.1117/1.jmm.11.2.021123

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