期刊
JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS
卷 8, 期 3, 页码 -出版社
SPIE-SOC PHOTO-OPTICAL INSTRUMENTATION ENGINEERS
DOI: 10.1117/1.3173803
关键词
lithography; polarization; projection systems; hyper NA
We introduce the new concept of orientation Zernike polynomials, a base function representation of retardation and diattenuation in close analogy to the wavefront description by scalar Zernike polynomials. We show that the orientation Zernike polynomials provide a complete and systematic description of vector imaging using high numerical aperture lithography lenses and, hence, a basis for an in depth understanding of both polarized and unpolarized imaging, and its modeling. (C) 2009 Society of Photo-Optical Instrumentation Engineers. [DOI: 10.1117/1.3173803]
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据