期刊
JOURNAL OF MATERIALS CHEMISTRY
卷 22, 期 28, 页码 14035-14041出版社
ROYAL SOC CHEMISTRY
DOI: 10.1039/c2jm31978k
关键词
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资金
- National Research Foundation (NRF) of Korea
- Ministry of Education, Science and Technology (MEST) of Korea [2011-0017449, NRF-C1AAA001-2009-0092938, ERC-R11-2005-048-00000-0]
- National Research Foundation of Korea [2008-0060668, 핵09A3016, 2012M1A2A2671718, 2009-0092938] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)
In this study, dual-triangularly patterned micro/nanorod hierarchical structures were fabricated using a simple combination of the microsphere lithography-reactive ion etching (RIE) process and the nanosphere lithography-RIE process in order to fabricate superhydrophobic surfaces. For the comparison of the wetting properties of the various hierarchical structures, the micro/nanorod geometries were controlled by changing the diameter of the microrod and/or nanorod under equal lattice constant and height conditions. Through the fabrication of two dimensional (2D) triangular SiO2 nanorod arrays (diameter: similar to 150 nm, lattice constant: 420 nm, height: similar to 250 nm) on 2D triangular SiO2 microrod arrays (diameter: similar to 842 nm, lattice constant: 2 mu m, height: similar to 1 mu m), the maximum contact angle (160.4 degrees) of the SiO2 micro/nanorod hierarchical structures was obtained via the subsequent coating of fluoroalkylsilane, leading to a strong superhydrophobicity. The facile two-step sphere lithography for the fabrication of superhydrophobic hierarchical structures on large scale glass wafers (2 inch) demonstrated that there are potential applications in the fields of microfluidic devices, lab-on-a-chip devices, and biological sensors.
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