4.3 Article

High-performance non-volatile CdS nanobelt-based floating nanodot gate memory

期刊

JOURNAL OF MATERIALS CHEMISTRY
卷 20, 期 21, 页码 4404-4408

出版社

ROYAL SOC CHEMISTRY
DOI: 10.1039/c000541j

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资金

  1. National Natural Science Foundation of China [60576037, 10774007, 10574008, 50732001]
  2. National Basic Research Program of China [2006CB921607, 2007CB613402]

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High-performance, non-volatile, floating nanodot gate memories (FNGMs) based on single CdS nanobelts (NBs) are reported. Their structure consists of a CdS NB field-effect transistor and Au nanodots embedded in high-kappa HfO2 top-gate dielectrics. Direct tunnelling of charges between the CdS NB and the Au nanodots causes a shift of the threshold. A simple thermal evaporation method was employed to fabricate high-density, uniformly distributed Au nanodots (similar to 3 x 10(12) cm(-2)) in between a 5 nm HfO2 tunnelling layer and a 15 nm HfO2 control oxide layer. Under a low operation voltage of 5 V, a typical as-fabricated FNGM has a large memory window of 3.2 V, long retention time of up to 10(5) s, and good stress endurance of more than 10(4) write/erase cycles. The working principle of the CdS nanobelt-based FNGM is discussed in detail in this paper.

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