Atomic layer deposition of hafnium silicate film for high mobility pentacene thin film transistor applications

标题
Atomic layer deposition of hafnium silicate film for high mobility pentacene thin film transistor applications
作者
关键词
-
出版物
JOURNAL OF MATERIALS CHEMISTRY
Volume 19, Issue 37, Pages 6857
出版商
Royal Society of Chemistry (RSC)
发表日期
2009-07-30
DOI
10.1039/b908216f

向作者/读者发起求助以获取更多资源

Find Funding. Review Successful Grants.

Explore over 25,000 new funding opportunities and over 6,000,000 successful grants.

Explore

Find the ideal target journal for your manuscript

Explore over 38,000 international journals covering a vast array of academic fields.

Search