期刊
JOURNAL OF INDUSTRIAL AND ENGINEERING CHEMISTRY
卷 20, 期 4, 页码 1772-1778出版社
ELSEVIER SCIENCE INC
DOI: 10.1016/j.jiec.2013.08.031
关键词
Nanolepidocrocite; Iron oxide; Response surface methodology; Pharmaceutics; Photo-Fenton
资金
- University of Tabriz Research Affairs Office
- University of Tabriz
Degradation of amoxicillin (AMX) by nanolepidocrocite chips/H2O2/UV method as a new photo-Fenton like process was investigated and optimized by response surface methodology (RSM). The optimal conditions were initial AMX concentration of 10 mg l(-1) and initial H2O2 concentration of 60 mg l(-1) at pH of 2 under UV radiation for 120 min. The general photo-Fenton process mechanism was applied to propose a new kinetic model for AMX degradation. According to this model, the reaction constant between AMX and (OH)-O-center dot was obtained 4.55 x 10(5) M-1 s(-1). Also, nanolepidocrocite showed good catalytic activity even after four successive degradation cycles. (C) 2013 The Korean Society of Industrial and Engineering Chemistry. Published by Elsevier B.V. All rights reserved.
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