4.4 Article Proceedings Paper

Adsorption of ammonia on hydrogen covered GaN(0001) surface - Density Functional Theory study

期刊

JOURNAL OF CRYSTAL GROWTH
卷 401, 期 -, 页码 514-517

出版社

ELSEVIER
DOI: 10.1016/j.jcrysgro.2013.10.061

关键词

Computer simulation; Surface processes; Metalorganic vapor phase epitaxy; Nitrides; Semiconducting III-V materials

资金

  1. National Science Center of Poland [DEC-2011/01/N/ST3/04382]
  2. PL-Grid Infrastructure

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Density Functional Theory (DFT) simulations of ammonia adsorption at clean and H-covered surface confirmed that ammonia may dissociate into NH2 radical and H adatom or remain in the molecular form. The remaining hydrogen atoms are attached to Ga atoms where the charge transfer to the surface is possible. The calculations show that for the molecular process, the ammonia adsorption energy is close to 2.0 eV, independent of hydrogen coverage. The dissociative process is strongly H-coverage dependent, for low H-coverage the adsorption energy is close to 2.8 eV, for high coverage changes by more than 4 eV reaching negative values. Thus for low coverage the energetically preferred adsorption is dissociative, for high is molecular. The dissociation energy and preferred mode change are related to the change of the Fermi level pinning from Ga broken bond state to valence band maximum (VBM), confirming the decisive role of charge transfer in the adsorption processes. (C) 2013 Elsevier B.V. All rights reserved.

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