期刊
JOURNAL OF CRYSTAL GROWTH
卷 405, 期 -, 页码 29-34出版社
ELSEVIER SCIENCE BV
DOI: 10.1016/j.jcrysgro.2014.07.043
关键词
Atomic force microscopy; Growth models; Physical vapor deposition processes; Polycrystalline deposition; Semiconducting lead compounds
资金
- National Natural Science Foundation of China [50902012]
- Scientific Research Foundation of CUIT [CSRF201005]
- Scientific Research Fund of Sichuan Provincial Education Department [10ZA131]
- Technology Support Program Fund of Science and Technology Department of Sichuan Province [2014GZ0020]
- Strategic Emerging Products Project Fund of Sichuan Province [2014GZX0012]
Pbl(2) polycrystalline thin films have been prepared by using a thermally physical vapor phase growth in vacuum. X-ray diffraction measurement and atomic force microscope analysis show that the structural change of the films occurs depending on growth condition. The width of the Urbach tail of the films indicates that the disordered structure inside the grains changes relying on preparation condition, It is found that the structure of the films is sensitive to growth parameter. A microstructure evolution model with respect to grain orientation is developed to explain the morphological and structural variation process during the films growth. (C) 2014 Elsevier B.V. All rights reserved.
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