期刊
JOURNAL OF CRYSTAL GROWTH
卷 347, 期 1, 页码 95-98出版社
ELSEVIER SCIENCE BV
DOI: 10.1016/j.jcrysgro.2012.03.028
关键词
Characterization; Molecular beam epitaxy; Semiconducting II-VI materials
资金
- National Basic Research Program of China [2011CB302002]
- National Natural Science Foundation of China [11134009, 61177040, 11074248, 10974197]
- Science and Technology Developing Project of Jilin Province [20111801]
By introducing excessive zinc during the growth process, degenerated Mg0.46Zn0.54O films have been prepared. The resistivity of the Mg0.46Zn0.54O films is only 0.053 Omega cm, and the electron concentration is 1.0 x 10(19) cm(-3), which is well above the Mott concentration of ZnO (2.9x 10(19) cm(-3)). The origin of such a high electron concentration can be attributed to the excessive zinc in the films. The results reported in this paper provide a route to conductive degenerated MgZnO films, thus may lay a ground for the fabrication of ZnO-based heterostructures or deep ultraviolet optoelectronic devices. (C) 2012 Elsevier B.V. All rights reserved.
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