期刊
JOURNAL OF CRYSTAL GROWTH
卷 315, 期 1, 页码 164-167出版社
ELSEVIER SCIENCE BV
DOI: 10.1016/j.jcrysgro.2010.07.067
关键词
Crystal morphology; Nanostructures; Metalorganic vapour phase epitaxy; Nitrides
We demonstrate the morphological properties of height, diameter and shape controlled N-face GaN nanorods (NRs) by adjusting conventional growth parameters of a standard metalorganic vapour phase epitaxy (MOVPE) growth process. Particularly the hydrogen fraction within the carrier gas was shown to be an important shaping tool for the grown nanostructures. Additionally, the aspect ratio of the NRs was successfully tuned by increasing the pitch of the nanoimprint lithography (NIL) pattern, while maintaining the hole-diameter constant. An optimum aspect ratio could be found at pitches between 400 and 800 nm, whereas larger pitches are counter-productive. The major conclusion drawn from our experiments is that the whole amount of growth material available over the masked surface contributes to the growth of the NRs. (C) 2010 Elsevier B.V. All rights reserved.
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