Growth of semiconducting iron sulfide thin films by chemical vapor deposition from air-stable single-source metal organic precursor for photovoltaic application

Semiconducting nanostructured iron sulfide thin films were prepared by aerosol chemical vapor deposition at 673 and 723 K from newly synthesized iron complex of dithiocarbo-1,2,3,4-tetrahydroquinoline [Fe(S2CNC9H10)(2)]. The degree of film surface roughness was determined by atomic force microscopy. The nature of the deposited thin films formed was determined by a combination of EDX analysis and glancing angle X-ray diffraction.