4.7 Article

Cobalt sulfide thin films for electrocatalytic oxygen evolution reaction and supercapacitor applications

期刊

JOURNAL OF COLLOID AND INTERFACE SCIENCE
卷 532, 期 -, 页码 491-499

出版社

ACADEMIC PRESS INC ELSEVIER SCIENCE
DOI: 10.1016/j.jcis.2018.08.012

关键词

Chemical bath deposition; Cobalt sulfide; Oxygen evolution reaction; Supercapacitor; Thin film

资金

  1. Department of Science and Technology-Science and Engineering Research Board (DST-SERB), New Delhi India [SERB/F/7448/2016-17]

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Nanocrystalline cobalt sulfide thin film electrodes have been deposited on stainless steel substrate using binder-free chemical bath deposition (CBD) method and electrochemical study is performed in 1 M KOH electrolyte. Linear sweep voltammetry (LSV) curve shows that cobalt sulfide thin film electrode requires 300 mV overpotential (eta) to reach the current density of 10 mA cm(-2). Also, it exhibits Tafel slope of 57 my decade(-1) with stable catalytic activity over 14 h. Along with good electrocatalytic oxygen evolution performance, in supercapacitive study it shows specific capacitance of 252.39 F g(-1) at a scan rate of 5 mV s(-1). The stability test indicates that cobalt sulfide electrode is stable for 1000 cyclic voltammetry (CV) cycles. (C) 2018 Elsevier Inc. All rights reserved.

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