期刊
JOURNAL OF COLLOID AND INTERFACE SCIENCE
卷 339, 期 1, 页码 202-207出版社
ACADEMIC PRESS INC ELSEVIER SCIENCE
DOI: 10.1016/j.jcis.2009.07.020
关键词
Wettability; Lithography; Dual roughness; Hierarchical structure
资金
- Center for Nanoscale Mechatronics and Manufacturing [08K1401-00210]
- Korea Science and Engineering Foundation [2007-02605]
- Micro Thermal System Research Center of Seoul National University
- National Research Foundation of Korea [2007-02605, 14-2008-01-001-00, 과C6A1803, 2007-2002605] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)
Micro- and nanoscale combined hierarchical polymer structures were fabricated by UV-assisted capillary force lithography. The method is based on the sequential application of engraved polymer molds with a UV-curable resin of polyurethane acrylate (PUA) followed by surface treatment with a trichloro(1H, 1H, 2H, 2H-perfluorooctyl) silane in vapor phase. Two distinct wetting states were observed on these dual-roughness structures. One is Cassie-Wenzel state where a water droplet forms heterogeneous contact with microstructures and homogeneous contact with nanostructures. The other is Cassie-Cassie state where a droplet makes heterogeneous contact both with micro-and nanostructures. A simple thermodynamic model was developed to explain static contact angle, hysteresis, and wetting transition on dual-roughness structures. (C) 2009 Elsevier Inc. All rights reserved.
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