标题
Structure and strain relaxation effects of defects in InxGa1−xN epilayers
作者
关键词
-
出版物
JOURNAL OF APPLIED PHYSICS
Volume 116, Issue 10, Pages 103513
出版商
AIP Publishing
发表日期
2014-09-11
DOI
10.1063/1.4894688
参考文献
相关参考文献
注意:仅列出部分参考文献,下载原文获取全部文献信息。- The effect of InGaN underlayers on the electronic and optical properties of InGaN/GaN quantum wells
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- Mg Doping Affects Dislocation Core Structures in GaN
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- Indium migration paths in V-defects of InAlN grown by metal-organic vapor phase epitaxy
- (2009) Th. Kehagias et al. APPLIED PHYSICS LETTERS
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- The influence of coalescence time on unintentional doping in GaN/sapphire
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