Improvement in plasma illumination properties of ultrananocrystalline diamond films by grain boundary engineering
出版年份 2013 全文链接
标题
Improvement in plasma illumination properties of ultrananocrystalline diamond films by grain boundary engineering
作者
关键词
-
出版物
JOURNAL OF APPLIED PHYSICS
Volume 114, Issue 5, Pages 054304
出版商
AIP Publishing
发表日期
2013-08-03
DOI
10.1063/1.4817377
参考文献
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注意:仅列出部分参考文献,下载原文获取全部文献信息。- Improvement in Tribological Properties by Modification of Grain Boundary and Microstructure of Ultrananocrystalline Diamond Films
- (2013) Kamatchi Jothiramalingam Sankaran et al. ACS Applied Materials & Interfaces
- Effect of CH4 concentration on the growth behavior, structure, and transparent properties of ultrananocrystalline diamond films synthesized by focused microwave Ar/CH4/H2 plasma jets
- (2013) Wen-Hsiang Liao et al. APPLIED SURFACE SCIENCE
- Effects of high energy Au-ion irradiation on the microstructure of diamond films
- (2013) Shih-Show Chen et al. JOURNAL OF APPLIED PHYSICS
- The induction of a graphite-like phase by Fe-coating/post-annealing process to improve the electron field emission properties of ultrananocrystalline diamond films
- (2012) Kuang-Yau Teng et al. DIAMOND AND RELATED MATERIALS
- Origin of a needle-like granular structure for ultrananocrystalline diamond films grown in a N2/CH4plasma
- (2012) K J Sankaran et al. JOURNAL OF PHYSICS D-APPLIED PHYSICS
- Tribological properties of ultrananocrystalline diamond and diamond nanorod films
- (2012) Kalpataru Panda et al. SURFACE & COATINGS TECHNOLOGY
- Defect structure for the ultra-nanocrystalline diamond films synthesized in H2-containing Ar/CH4 plasma
- (2011) Huang-Chin Chen et al. DIAMOND AND RELATED MATERIALS
- Modification on the Microstructure of Ultrananocrystalline Diamond Films for Enhancing Their Electron Field Emission Properties via a Two-Step Microwave Plasma Enhanced Chemical Vapor Deposition Process
- (2011) Hsiu-Fung Cheng et al. Journal of Physical Chemistry C
- Origin of platelike granular structure for the ultrananocrystalline diamond films synthesized in H2-containing Ar/CH4 plasma
- (2010) Chuan-Sheng Wang et al. JOURNAL OF APPLIED PHYSICS
- Validating optical emission spectroscopy as a diagnostic of microwave activated CH4/Ar/H2 plasmas used for diamond chemical vapor deposition
- (2009) Jie Ma et al. JOURNAL OF APPLIED PHYSICS
- On the mechanism of enhancement on electron field emission properties for ultrananocrystalline diamond films due to ion implantation
- (2009) P T Joseph et al. JOURNAL OF PHYSICS D-APPLIED PHYSICS
- Kinetics of microplasma atmospheric ion generation correlated with discharge current
- (2008) Yasufumi Hozumi et al. JOURNAL OF ELECTROSTATICS
- From Ultrananocrystalline Diamond to Single Crystal Diamond Growth in Hot Filament and Microwave Plasma-Enhanced CVD Reactors: a Unified Model for Growth Rates and Grain Sizes
- (2008) Paul W. May et al. Journal of Physical Chemistry C
- Microplasma array devices with coplanar electrodes operating in neon
- (2008) L.G. Meng et al. PHYSICS LETTERS A
- Generation of microplasma jet at atmospheric pressure using a modified waveguide-based plasma torch
- (2008) S. Kanazawa et al. SURFACE & COATINGS TECHNOLOGY
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