The thermally-induced reaction of thin Ni films with Si: Effect of the substrate orientation

Morphological stability and specific resistivity of sub-10 nm silicide films of Ni1−xPtx on Si substrate

(2010) Zhen Zhang et al.   APPLIED PHYSICS LETTERS

Metastable phase formation during the reaction of Ni films with Si(001): The role of texture inheritance

(2010) S. Gaudet et al.   JOURNAL OF APPLIED PHYSICS

Influence of a transient hexagonal phase on the microstructure and morphological stability of NiSi films

(2009) C. Van Bockstael et al.   APPLIED PHYSICS LETTERS

In situ study of the formation of silicide phases in amorphous Ni–Si mixed layers

(2009) C. Van Bockstael et al.   JOURNAL OF APPLIED PHYSICS

Epitaxial Formation of a Metastable Hexagonal Nickel–Silicide

(2008) K. De Keyser et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Texture of NiSi films on Si(001), (111), and (110) substrates

(2008) C. Detavernier et al.   JOURNAL OF APPLIED PHYSICS