Influence of net doping, excess carrier density and annealing on the boron oxygen related defect density in compensated n-type silicon

标题
Influence of net doping, excess carrier density and annealing on the boron oxygen related defect density in compensated n-type silicon
作者
关键词
-
出版物
JOURNAL OF APPLIED PHYSICS
Volume 110, Issue 6, Pages 063708
出版商
AIP Publishing
发表日期
2011-09-21
DOI
10.1063/1.3633492

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