Structural and morphological characterization of molecular beam epitaxy grown Si/Ge multilayer using x-ray scattering techniques

标题
Structural and morphological characterization of molecular beam epitaxy grown Si/Ge multilayer using x-ray scattering techniques
作者
关键词
-
出版物
JOURNAL OF APPLIED PHYSICS
Volume 110, Issue 10, Pages 102204
出版商
AIP Publishing
发表日期
2011-12-01
DOI
10.1063/1.3661165

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