Bandgap shift by quantum confinement effect in 〈100〉 Si-nanowires derived from threshold-voltage shift of fabricated metal-oxide-semiconductor field effect transistors and theoretical calculations

标题
Bandgap shift by quantum confinement effect in 〈100〉 Si-nanowires derived from threshold-voltage shift of fabricated metal-oxide-semiconductor field effect transistors and theoretical calculations
作者
关键词
-
出版物
JOURNAL OF APPLIED PHYSICS
Volume 109, Issue 6, Pages 064312
出版商
AIP Publishing
发表日期
2011-03-25
DOI
10.1063/1.3559265

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