4.6 Article

AlGaN/GaN high electron mobility transistors as a voltage-tunable room temperature terahertz sources

期刊

JOURNAL OF APPLIED PHYSICS
卷 107, 期 2, 页码 -

出版社

AMER INST PHYSICS
DOI: 10.1063/1.3291101

关键词

aluminium compounds; gallium compounds; high electron mobility transistors; III-V semiconductors; wide band gap semiconductors

资金

  1. MIC, Japan
  2. JSPS, Japan
  3. Ramon Y. Cajal program in Spain
  4. Spanish MICINN [TEC2008-02281]

向作者/读者索取更多资源

We report on room temperature terahertz generation by a submicron size AlGaN/GaN-based high electron mobility transistors. The emission peak is found to be tunable by the gate voltage between 0.75 and 2.1 THz. Radiation frequencies correspond to the lowest fundamental plasma mode in the gated region of the transistor channel. Emission appears at a certain drain bias in a thresholdlike manner. Observed emission is interpreted as a result of Dyakonov-Shur plasma wave instability in the gated two-dimensional electron gas.

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