Off-axis deposition of Al layer for low resistance tunnel barrier

In order to improve the magnetic and electrical properties of low resistance alumina based magnetic tunnel junctions, an off-axis method of sputtering has been investigated. It is shown that the tunnel magnetoresistance ratio can be greatly increased when there is an offset between the target and the wafer axes during the deposition of the ultrathin aluminum layer (off-axis sputtering) prior to its natural oxidation. The ferromagnetic coupling between the pinned and the free layer through the alumina barrier is also reduced compared to a classical on-axis deposition. This observation is interpreted as an improvement of the barrier quality, reducing both the roughness and the pinholes density. We assume that when the Al layer is sputtered off-axis, the magnetic and aluminum layers are protected from energetic neutralized Ar atoms bombardment. (C) 2010 American Institute of Physics. [doi: 10.1063/1.3358602]