Plasma sheath physics and dose uniformity in enhanced glow discharge plasma immersion ion implantation and deposition

标题
Plasma sheath physics and dose uniformity in enhanced glow discharge plasma immersion ion implantation and deposition
作者
关键词
-
出版物
JOURNAL OF APPLIED PHYSICS
Volume 106, Issue 1, Pages 013313
出版商
AIP Publishing
发表日期
2009-07-15
DOI
10.1063/1.3160309

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