4.6 Article

Influence of interfacial dislocations on hysteresis loops of ferroelectric films

期刊

JOURNAL OF APPLIED PHYSICS
卷 104, 期 10, 页码 -

出版社

AMER INST PHYSICS
DOI: 10.1063/1.3021354

关键词

barium compounds; coercive force; dielectric hysteresis; dielectric polarisation; dislocation density; electric domains; ferroelectric thin films

资金

  1. Laboratory-Directed Research and Development Program under DOE
  2. NSF [DMR0507146, DMR-0820404]
  3. Department of Energy [DE-FG02-07ER46417]
  4. U.S. Department of Energy (DOE) [DE-FG02-07ER46417] Funding Source: U.S. Department of Energy (DOE)
  5. Division Of Materials Research
  6. Direct For Mathematical & Physical Scien [820404] Funding Source: National Science Foundation

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We investigated the influence of dislocations, located at the interface of a ferroelectric film and its underlying substrate, on the ferroelectric hysteresis loop including the remanent polarization and coercive field using phase-field simulations. We considered epitaxial ferroelectric BaTiO3 films and found that the hysteresis loop is strongly dependent on the type and density of interfacial dislocations. The dislocations that stabilize multiple ferroelectric variants and domains reduce the coercive field, and consequently, the corresponding remanent polarization also decreases.

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