Electrical, structural, and chemical properties of HfO2 films formed by electron beam evaporation

标题
Electrical, structural, and chemical properties of HfO2 films formed by electron beam evaporation
作者
关键词
-
出版物
JOURNAL OF APPLIED PHYSICS
Volume 104, Issue 6, Pages 064113
出版商
AIP Publishing
发表日期
2008-09-26
DOI
10.1063/1.2978209

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