Effect of chlorine residue on electrical performance of atomic layer deposited hafnium silicate

标题
Effect of chlorine residue on electrical performance of atomic layer deposited hafnium silicate
作者
关键词
-
出版物
JOURNAL OF APPLIED PHYSICS
Volume 103, Issue 11, Pages 114102
出版商
AIP Publishing
发表日期
2008-06-05
DOI
10.1063/1.2938073

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