4.5 Article

Obtaining the structure factors for an epitaxial film using Cu X-ray radiation

期刊

JOURNAL OF APPLIED CRYSTALLOGRAPHY
卷 46, 期 -, 页码 1749-1754

出版社

INT UNION CRYSTALLOGRAPHY
DOI: 10.1107/S002188981302414X

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资金

  1. Czech Science Foundation [P204/11/P339]
  2. ERC [239739 STEMOX, 268066-0MSPIN]
  3. ORNL's Shared Research Equipment (ShaRE) User Facility
  4. Office of BES, US DOE
  5. Spanish Ministerio de Ciencia e Innovacion Tecnologica [MAT2009-07967, NANOSELECT CSD2007-00041]
  6. Generalitat de Catalunya
  7. Ministry of Education of the Czech Republic [LM2011026]
  8. Fondazione Cariplo via the project EcoMag [2010-0584]

向作者/读者索取更多资源

Determining atomic positions in thin films by X-ray diffraction is, at present, a task reserved for synchrotron facilities. Here an experimental method is presented which enables the determination of the structure factor amplitudes of thin films using laboratory-based equipment (Cu K alpha radiation). This method was tested using an epitaxial 130 nm film of CuMnAs grown on top of a GaAs substrate, which unlike the orthorhombic bulk phase forms a crystal structure with tetragonal symmetry. From the set of structure factor moduli obtained by applying this method, the solution and refinement of the crystal structure of the film has been possible. The results are supported by consistent high-resolution scanning transmission electron microscopy and stoichiometry analyses.

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