Contrast matching of an Si substrate with polymer films by anomalous dispersion at the Si K absorption edge

Anomalous dispersion at the Si K absorption edge has been used to control the reflection from the interface between a film and an Si substrate, which otherwise complicates the nanostructure analysis of such a film, particularly for the soft-matter case, in grazing-incidence small-angle scattering. Such a reflectionless condition has been chosen for a triblock copolymer thin film, and two-dimensional grazing-incidence small-angle scattering patterns were obtained without the effect of the reflection. The present approach is useful for analysing nanostructures without introducing complicated corrections arising from the reflection.