期刊
JOURNAL OF ALLOYS AND COMPOUNDS
卷 563, 期 -, 页码 280-284出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/j.jallcom.2013.02.040
关键词
Electron irradiation; ZnO thin films; Nanostructures; Optical properties
The present work deals with the formation of nanostructures and tuning of optical band gap of ZnO thin films by high energy electron bombardment. In first step, Zinc Oxide (ZnO) thin films were deposited on silicon (1 0 0) substrates by pulsed laser deposition (PLD) technique using KrF Excimer laser. In second step, ZnO thin films were irradiated by electron beam of energy 6, 9, 12 and 15 MeV at constant dose. The surface morphology was studied by Atomic Force Microscope (AFM), whereas the optical properties were determined by Spectroscopic Ellipsometry (SE). Atomic force micrographs showed the formation of nanoscale structures on the surface of ZnO thin film. The nanostructures grew in size and reached its maximum size at 12 MeV electron energy. SE analysis revealed the increase in refractive index, appearance of broad absorption peak in visible region, and increase in optical band gap energy of ZnO thin film by 12 MeV electron bombardment. From the results, it can be concluded that the size of nanostructures and the optical band gap energy of ZnO thin films can be tuned by electron irradiation at various energies. (c) 2013 Elsevier B.V. All rights reserved.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据