Infiltration of silica colloidal crystals with molten salts and semiconductors under capillary forces

A technique for filling pores of bulk and film silica colloidal crystals (artificial opals) with melts of salts (NaCl, Agl) and semiconductors (V2O5, InSb) having relatively high melting points (T-m = 500-800 degrees C) using capillary forces is suggested. The pore filling degrees of 70 +/- 8 vol.% for NaCl, 70 +/- 4 vol.% for V2O5, 97 +/- 3 vol.% for AgI, and 98 +/- 3 vol.% for InSb have been achieved. (c) 2009 Elsevier B.V. All rights reserved.