期刊
JOURNAL OF ALLOYS AND COMPOUNDS
卷 489, 期 2, 页码 519-522出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/j.jallcom.2009.09.098
关键词
Semiconductor; Thin film; Crystal growth; X-ray diffraction
资金
- Doctoral Program Foundation of Institutions of Higher Education of China [200804871144]
- New Century Excellent Talents in University [NCET-08-0214]
- Hubei Province Science Fund for Distinguished Young Scholars [2008CDB334]
- Natural Science Foundation of Huazhong University of Science and Technology [20072008B]
- National Science Foundation for Post-doctoral Scientists of China [20080430141]
- National Natural Science Foundation of China [60976042]
In this work, non-polar (1,1,-2,0) ZnO thin films have been grown on a-GaN/r-Al2O3 templates by raidio-frequency magnetron sputtering. By varying the substrate temperature, the ZnO thin films were transformed from polycrystalline structure to epitaxial one on a-GaN/r-Al2O3 templates. High-quality (1,1,-2,0) ZnO epitaxial thin films were grown on the a-GaN/r-Al2O3 template at the optimized condition of 300 degrees C, which was confirmed by X-ray diffraction. The full width at half maximum (FWHM) of the (1,1,-2,0) omega-rocking curve of the a-plane ZnO films grown on the a-GaN/r-Al2O3 template was 0.51 degrees, indicating a small mosaicity and a low dislocation density in the ZnO film grown on the a-GaN/r-Al2O3 template. Its surface roughness observed by atomic force microscopy was about 2.32 nm. Furthermore, the comparative investigation results show that the ZnO films grown on a-GaN/r-Al2O3 templates are more likely to form in the (1,1,-2,0)-orientation than those directly grown on r-sapphire. (C) 2009 Elsevier B.V. All rights reserved.
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