期刊
JOURNAL OF ALLOYS AND COMPOUNDS
卷 457, 期 1-2, 页码 549-554出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/j.jallcom.2007.03.095
关键词
oxygen partial pressure; magnetron sputtering; SrBi2Ta2O9 thin film; polarization property; substitution
During magnetron sputtering deposition of SrBi2Ta2O9 thin films, oxygen gas is introduced in the deposition chamber to compensate the oxygen loss during sputtering. In this paper, the influence of oxygen partial pressure is systematically investigated in sputtering of Sr0.8Nd0.3Bi2.5Ta2O9+x thin films, using X-ray diffraction, X-ray photoelectron spectroscopy and field emission scanning electron microscopy. The studies confirm that at various oxygen partial pressure Nd3+ ions substitute into the bismuth layered perovskite structure, preferentially at the SP2+ site. The deposition rate, composition, microstructure and polarization properties of the films highly depend on the oxygen partial pressure. (C) 2007 Elsevier B.V. All rights reserved.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据