期刊
NANO LETTERS
卷 15, 期 10, 页码 6751-6755出版社
AMER CHEMICAL SOC
DOI: 10.1021/acs.nanolett.5b02597
关键词
Thin film adhesion; fracture mechanics; interfacial nanostructures; nanosphere lithography; barrier film; UV degradation
类别
资金
- Department of Energy through the Bay Area Photovoltaic Consortium [DE-EE0004946]
Alternating layers of organic and oxide thin films used as diffusion barriers in emerging flexible device technologies are vulnerable to degradation under the influence of mechanical stresses, temperature cycling, photo degradation, and chemically active environmental species. Delamination of the internal organic to oxide interfaces often limits the operational lifetime of the barrier system. We demonstrate a method for increasing the adhesion of organic and oxide thin films by generating nanostructures at the interface. We show that the adhesion of an acrylate to silicon oxide model system can be increased by up to an order of magnitude (from similar to 2 J/m(2) to 24 J/m(2)). By altering the diameter and depth of the patterns in the model systems, the adhesion energy can be changed, and the delamination pathway can be controlled. In addition, we show that a patterned interface maintains a higher adhesion than its planar counterpart for all durations of UV-A and UV-B exposure.
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