Damage Recovery by Reductive Chemistry after Methanol-Based Plasma Etch to Fabricate Magnetic Tunnel Junctions

标题
Damage Recovery by Reductive Chemistry after Methanol-Based Plasma Etch to Fabricate Magnetic Tunnel Junctions
作者
关键词
-
出版物
JAPANESE JOURNAL OF APPLIED PHYSICS
Volume 51, Issue -, Pages 08HA01
出版商
Japan Society of Applied Physics
发表日期
2012-08-20
DOI
10.1143/jjap.51.08ha01

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